Laser Marker LP100


The LP100 excels, especially when it comes to marking and engraving applications that require high levels of power and high speeds. With a laser power of 100 watts, one of FOBA’s most powerful marking lasers. Whether into laser engraving machines, production facilities oder production lines, the LP100 is capable of being smoothly integrated and can be deployed in a variety of ways for the fully automatic components marking and the process of tagging parts with barcodes, 2D codes, alphanumeric characters, graphics, logos, customized data and many more.





Main fields of application

Markings that are applied when the object is stationary or in motion; Laser marking of materials that are difficult to mark; Plastic and metal markings as well as all types of engraving applications that require high laser power and/or marking speed

Technical specifications

Marking features

Marking fields*
    • 110 x 110 mm² (f=160 mm), depends on the focusing optics used
    • Up to 5,000 mm/s, up to 500 characters/s
Line width
    • 100 µm (optional 50 µm)



    • Nd:YAG, lamp-pumped, wavelength 1,064 nm
Laser class
    • 4 (as per DIN EN 60825-1)
    • 8 different diameters



    • Modular Compact PCI-PC, Windows XP
Laser control
    • Fobagraf with import function for plt/ dwg/ dxf/ ai/ jpg/ tif/ pcx/ bmp etc.
    • Serial, digital inputs/outputs, Ethernet, USB, Profibus



Electrical requirements
    • 3/N/PE, AC 400 V, ± 10%, 50/60 Hz
Power consumption
    • Typically 6.0 kW
IP ratings
    • Marking unit IP54, control rack (supply unit and laser control)/chiller cabinet each IP43 (IP54 optional)
    • Water to water cooler, optional water to air cooler

    • 15 – 40 °C
    • Rel. 90 % (max. 20 °C), 30 % (max. 40 °C), non-condensing 
    • Marking unit approx. 34 kg (without F-Theta lens), control rack/chiller cabinet each approx. 60 kg (with OEM components)



Pointing laser
    • As an adjustment aid
Interchangeable lenses
    • 100 mm/163 mm/254 mm/420 mm
Interchangeable deflection unit
SHG module
    • For frequency doubling (532 nm)


*application dependent